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Modelling of plasma etching process using radial basis function network and genetic algorithm
Dongil Han, Seung Bin Moon, Kyungyoung Park, Byungwhan Kim, Kyeong Kyun Lee, Nam Jeung KimVolume:
79
Année:
2005
Langue:
english
Pages:
8
DOI:
10.1016/j.vacuum.2005.03.001
Fichier:
PDF, 224 KB
english, 2005