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Using hybrid ionized physical vapor deposition to control interface reaction during titanium deposition onto aluminum under-layer
Chengyu Niu, Greg Magsamen, Brian Stephenson, Jakisa RadjaVolume:
517
Année:
2009
Langue:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.02.025
Fichier:
PDF, 731 KB
english, 2009