Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering
L. Gallais, H. Krol, J.Y. Natoli, M. Commandré, M. Cathelinaud, L. Roussel, M. Lequime, C. AmraVolume:
515
Année:
2007
Langue:
english
Pages:
7
DOI:
10.1016/j.tsf.2006.10.011
Fichier:
PDF, 625 KB
english, 2007