
Photoresist etching using Ar/O2 and He/O2 atmospheric pressure plasma
Mi-Hee Jung, Ho-Suk ChoiVolume:
515
Année:
2006
Langue:
english
Pages:
8
DOI:
10.1016/j.tsf.2006.03.030
Fichier:
PDF, 939 KB
english, 2006