Etch rate and surface morphology of polycrystalline β-silicon carbide using chlorine trifluoride gas
Hitoshi Habuka, Satoko Oda, Yasushi Fukai, Katsuya Fukae, Takashi Takeuchi, Masahiko AiharaVolume:
514
Année:
2006
Langue:
english
Pages:
5
DOI:
10.1016/j.tsf.2006.02.099
Fichier:
PDF, 221 KB
english, 2006