Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of β-FeSi2 optoelectronic devices
Teruhisa Ootsuka, Zhengxin Liu, Masato Osamura, Yasuhiro Fukuzawa, Ryo Kuroda, Yasuhito Suzuki, Naotaka Otogawa, Takahiro Mise, Shinan Wang, Yasushi Hoshino, Yasuhiko Nakayama, Hisao Tanoue, YunosukeVolume:
476
Année:
2005
Langue:
english
Pages:
5
DOI:
10.1016/j.tsf.2004.06.145
Fichier:
PDF, 464 KB
english, 2005