SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Development of imprint materials for the Step and Flash Imprint Lithography process
Xu, Frank, Stacey, Nicholas A., Watts, Mike, Truskett, Van, McMackin, Ian, Choi, Jin, Schumaker, Philip, Thompson, Ecron, Babbs, Daniel, Sreenivasan, S. V., Willson, C. Grant, Schumaker, Norman, MackaVolume:
5374
Année:
2004
Langue:
english
DOI:
10.1117/12.538734
Fichier:
PDF, 559 KB
english, 2004
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