Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution
Chii-Rong Yang, Po-Ying Chen, Yuang-Cherng Chiou, Rong-Tsong LeeVolume:
119
Année:
2005
Langue:
english
Pages:
8
DOI:
10.1016/j.sna.2004.07.015
Fichier:
PDF, 416 KB
english, 2005