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Mass Spectrometric Detection of Intermediates in Chemical Vapor Deposition of Si[sub 3]N[sub 4] from SiCl[sub 4] and NH[sub 3]
Lin, Sin-ShongVolume:
125
Année:
1978
Langue:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2131315
Fichier:
PDF, 403 KB
english, 1978