Influence of Titanium Nitride Cap Layer Thickness on the Oxygen Sensitivity of Cobalt Films During Silicide Processing
Hoffman, Nathan J, Ketcheson, Roger, Stambaugh, Daniel, Safran, Laura, Campos, Richard, Mase, Jerry, Codi, DanielVolume:
1108
Langue:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1108-A09-07
Date:
January, 2008
Fichier:
PDF, 502 KB
english, 2008