Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing
Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi SekiguchiVolume:
88
Année:
2011
Langue:
english
Pages:
4
DOI:
10.1016/j.mee.2011.01.019
Fichier:
PDF, 781 KB
english, 2011