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Fabrication and electrical characteristics of ultrathin (HfO2)x(SiO2)1−x films by surface sol–gel method and reaction-anneal treatment
You-Pin Gong, Ai-Dong Li, Chao Zhao, Yi-Dong Xia, Di WuVolume:
87
Année:
2010
Langue:
english
Pages:
4
DOI:
10.1016/j.mee.2009.10.004
Fichier:
PDF, 347 KB
english, 2010