Performance of molecular resist based on polyphenol in EUV lithography
Hiroaki Oizumi, Fumiaki Kumasaka, Yuusuke Tanaka, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera, Atsuko Yamaguchi, Iwao NishiyamaVolume:
83
Année:
2006
Langue:
english
Pages:
4
DOI:
10.1016/j.mee.2006.01.025
Fichier:
PDF, 511 KB
english, 2006