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Modeling for V—O 2 reactive sputtering process using a pulsed power supply
Wang, Tao, Yu, He, Dong, Xiang, Jiang, Ya-Dong, Chen, Chao, Wu, Ro-LandVolume:
23
Langue:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/23/8/088113
Date:
August, 2014
Fichier:
PDF, 803 KB
english, 2014