Oxygen Gas Barrier Properties of Hydrogenated Amorphous Carbon Thin Films Deposited with a Pulse-Biased Inductively Coupled Plasma Chemical Vapor Deposition Method
Baek, Sang-min, Shirafuji, Tatsuru, Cho, Sung-pyo, Saito, Nagahiro, Takai, OsamuVolume:
49
Langue:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.49.08jf10
Date:
August, 2010
Fichier:
PDF, 563 KB
english, 2010