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[IEEE 2014 IEEE 12th International Conference on Solid -State and Integrated Circuit Technology (ICSICT) - Guilin, China (2014.10.28-2014.10.31)] 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - A comparative study of Ge MOSFET using Al2O3/GeOx/Ge stacks-forming high quality GeOx interface layer to boost device performance
Xu Yang,, Wang, Sheng-Kai, Bing Sun,, Wei Zhao,, Hu-Dong Chang,, Zhen-Hua Zeng,, Xiong Zhang,, Yi-Ping Cui,, Hong-Gang Liu,Année:
2014
Langue:
english
DOI:
10.1109/icsict.2014.7021338
Fichier:
PDF, 675 KB
english, 2014