Implanted hydrogen isotope retention and chemical behavior in boron thin films for wall conditioning
Y Oya, H Kodama, M Oyaidzu, Y Morimoto, M Matsuyama, A Sagara, N Noda, K OkunoVolume:
329-333
Année:
2004
Langue:
english
Pages:
4
DOI:
10.1016/j.jnucmat.2004.04.279
Fichier:
PDF, 291 KB
english, 2004