Characteristics of Nanoscale Lithography Using AFM with a Current-Controlled Exposure System
Ishibashi, Masayoshi, Heike, Seiji, Kajiyama, Hiroshi, Wada, Yasuo, Hashizume, TomihiroVolume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.37.1565
Date:
March, 1998
Fichier:
PDF, 1.33 MB
1998