Effect of polymer matrix and photoacid generator on the lithographic properties of chemically amplified photoresist
Bulgakova, S. A., Gurova, D. A., Zaitsev, S. D., Kulikov, E. E., Skorokhodov, E. V., Toropov, M. N., Pestov, A. E., Chkhalo, N. I., Salashchenko, N. N.Volume:
43
Langue:
english
Journal:
Russian Microelectronics
DOI:
10.1134/s1063739714050023
Date:
November, 2014
Fichier:
PDF, 208 KB
english, 2014