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Tungsten nitride thin films deposited by MOCVD: sources of carbon and effects on film structure and stoichiometry
Omar J. Bchir, Kelly M. Green, Mark S. Hlad, Timothy J. Anderson, Benjamin C. Brooks, Lisa McElwee-WhiteVolume:
261
Année:
2004
Langue:
english
Pages:
9
DOI:
10.1016/j.jcrysgro.2003.11.018
Fichier:
PDF, 243 KB
english, 2004