[IEEE 2007 International Semiconductor Device Research Symposium - College Park, MD, USA (2007.12.12-2007.12.14)] 2007 International Semiconductor Device Research Symposium - Silicon nanowire fabrication using novel hydrogenation-assisted deep reactive ion etching
Amir Sammak,, Soheil Azimi,, Shams Mohajerzadeh,, Bahar Khadem-Hosseini,, Babak Fallah-Azad,Année:
2007
Langue:
english
DOI:
10.1109/isdrs.2007.4422497
Fichier:
PDF, 764 KB
english, 2007