[IEEE 2010 20th International Conference on Pattern Recognition (ICPR) - Istanbul, Turkey (2010.08.23-2010.08.26)] 2010 20th International Conference on Pattern Recognition - Automated Cephalometric Landmark Identification Using Shape and Local Appearance Models
Keustermans, Johannes, Mollemans, Wouter, Vandermeulen, Dirk, Suetens, PaulAnnée:
2010
Langue:
english
DOI:
10.1109/icpr.2010.603
Fichier:
PDF, 416 KB
english, 2010