[IEEE 2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - San Jose, CA, USA (2010.11.7-2010.11.11)] 2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - SMATO: Simultaneous mask and target optimization for improving lithographic process window
Banerjee, Shayak, Agarwal, Kanak B., Orshansky, MichaelAnnée:
2010
Langue:
english
DOI:
10.1109/iccad.2010.5654341
Fichier:
PDF, 966 KB
english, 2010