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[IEEE 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Cannizzaro, Catania, Italy (2007.10.2-2007.10.5)] 2007 15th International Conference on Advanced Thermal Processing of Semiconductors - Highly Reliable Rapid Thermal Selective Gate Re-Oxidation Process of Advanced Metal Gate Stacks with Tungsten Electrode
Niess, J., Kirchner, C., Dietl, W., Meyer, H.-J., Nadig, B., Lerch, W., Costina, I., Kurps, R., Bolze, D.Année:
2007
Langue:
english
DOI:
10.1109/rtp.2007.4383844
Fichier:
PDF, 4.17 MB
english, 2007