Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 4
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Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals
Shir, Daniel J., Nelson, Erik C., Chanda, Debashis, Brzezinski, Andrew, Braun, Paul V., Rogers, John A., Wiltzius, PierreVolume:
28
Année:
2010
Langue:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3456181
Fichier:
PDF, 1.57 MB
english, 2010