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Impact of interface controlling layer of Al[sub 2]O[sub 3] for improving the retention behaviors of In–Ga–Zn oxide-based ferroelectric memory transistor
Yoon, Sung-Min, Yang, Shin-Hyuk, Jung, Soon-Won, Byun, Chun-Won, Park, Sang-Hee Ko, Hwang, Chi-Sun, Lee, Gwang-Geun, Tokumitsu, Eisuke, Ishiwara, HiroshiVolume:
96
Année:
2010
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3452339
Fichier:
PDF, 394 KB
english, 2010