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[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Characteristics of as-grown hole trapping in silicon oxynitride p-MOSFETs subjected to negative bias temperature stress
Wang, Yangang, Zhang, J. F., Chang, M. H., Mingzhen Xu,, Changhua Tan,Année:
2008
Langue:
english
DOI:
10.1109/icsict.2008.4734624
Fichier:
PDF, 580 KB
english, 2008