Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1992 / 3 Vol. 10; Iss. 2
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Silylation of novolac based resists: Influence of deep-ultraviolet induced crosslinking
Op de Beeck, MaaikeVolume:
10
Langue:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586435
Date:
March, 1992
Fichier:
PDF, 1.73 MB
english, 1992