Fabrication of sub-12 nm thick silicon nanowires by processing scanning probe lithography masks
Kyoung Ryu, Yu, Aitor Postigo, Pablo, Garcia, Fernando, Garcia, RicardoVolume:
104
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4881977
Date:
June, 2014
Fichier:
PDF, 781 KB
english, 2014