Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF[sub 2][sup +], CHF[sub 2][sup +], and CH2F+ ions
Ito, Tomoko, Karahashi, Kazuhiro, Fukasawa, Masanaga, Tatsumi, Tetsuya, Hamaguchi, SatoshiVolume:
29
Année:
2011
Langue:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3610981
Fichier:
PDF, 575 KB
english, 2011