Atomic layer-by-layer oxidation of Ge (100) and (111) surfaces by plasma post oxidation of Al2O3/Ge structures
Zhang, Rui, Huang, Po-Chin, Lin, Ju-Chin, Takenaka, Mitsuru, Takagi, ShinichiVolume:
102
Année:
2013
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4794013
Fichier:
PDF, 919 KB
english, 2013