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Effects of substrate bias and nitrogen flow ratio on the resistivity, density, stoichiometry, and crystal structure of reactively sputtered ZrN[sub x] thin films
Wang, Shin-Hui, Chang, Ching-Chun, Chen, J. S.Volume:
22
Année:
2004
Langue:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1776182
Fichier:
PDF, 677 KB
english, 2004