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Boron- and phosphorus-doped polycrystalline silicon thin films prepared by silver-induced layer exchange
Antesberger, T., Wassner, T. A., Jaeger, C., Algasinger, M., Kashani, M., Scholz, M., Matich, S., Stutzmann, M.Volume:
102
Année:
2013
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4808024
Fichier:
PDF, 635 KB
english, 2013