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Grain boundary assisted degradation and breakdown study in cerium oxide gate dielectric using scanning tunneling microscopy
Shubhakar, K., Pey, K. L., Kushvaha, S. S., O’Shea, S. J., Raghavan, N., Bosman, M., Kouda, M., Kakushima, K., Iwai, H.Volume:
98
Année:
2011
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3553190
Fichier:
PDF, 944 KB
english, 2011