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[IEEE International Electron Devices Meeting. IEDM Technical Digest - Washington, DC, USA (7-10 Dec. 1997)] International Electron Devices Meeting. IEDM Technical Digest - Damascene integration of copper and ultra-low-k xerogel for high performance interconnects
Zielinski, E.M., Russell, S.W., List, R.S., Wilson, A.M., Jin, C., Newton, K.J., Lu, J.P., Hurd, T., Hsu, W.Y., Cordasco, V., Gopikanth, M., Korthuis, V., Lee, W., Cerny, G., Russell, N.M., Smith, P.BAnnée:
1997
Langue:
english
DOI:
10.1109/iedm.1997.650536
Fichier:
PDF, 428 KB
english, 1997