
[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Comparison of the Ru thin films grown on Si, TiN/Si and TaN/Si substrates by plasma enhanced atomic layer deposition
Xie, Qi, Musschoot, Jan, Detavernier, Christophe, Deduytsche, Davy, Van Meirhaeghe, Roland L., Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-PingAnnée:
2008
Langue:
english
DOI:
10.1109/icsict.2008.4734770
Fichier:
PDF, 2.62 MB
english, 2008