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Schottky barrier lowering with the formation of crystalline Er silicide on n-Si upon thermal annealing
Reckinger, Nicolas, Tang, Xiaohui, Bayot, Vincent, Yarekha, Dmitri A., Dubois, Emmanuel, Godey, Sylvie, Wallart, Xavier, Larrieu, Guilhem, Łaszcz, Adam, Ratajczak, Jacek, Jacques, Pascal J., Raskin, JVolume:
94
Année:
2009
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3136849
Fichier:
PDF, 637 KB
english, 2009