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Effect of heating ramp rates on transient enhanced diffusion in ion-implanted silicon
Mannino, G., Stolk, P. A., Cowern, N. E. B., de Boer, W. B., Dirks, A. G., Roozeboom, F., van Berkum, J. G. M., Woerlee, P. H., Toan, N. N.Volume:
78
Année:
2001
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1347397
Fichier:
PDF, 314 KB
english, 2001