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Combining high resolution and tensorial analysis in Raman stress measurements of silicon
Bonera, Emiliano, Fanciulli, Marco, Batchelder, David N.Volume:
94
Année:
2003
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1592872
Fichier:
PDF, 1.10 MB
english, 2003