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Hydrogen, fluorine ion implantation effects on polycrystalline silicon grain boundaries
Akihisa Yoshida, Masatoshi Kitagawa, Fumiyo Tojo, Nobutaka Egashira, Keisuke Nakagawa, Tomio Izumi, Takashi HiraoVolume:
34
Année:
1994
Langue:
english
Pages:
7
DOI:
10.1016/0927-0248(94)90042-6
Fichier:
PDF, 310 KB
english, 1994