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Gate Stack Reliability of MOSFETs With High-Mobility Channel Materials: Bias Temperature Instability
Gong, Xiao, Liu, Bin, Yeo, Yee-ChiaVolume:
13
Langue:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2013.2277935
Date:
December, 2013
Fichier:
PDF, 1.23 MB
english, 2013