The study of temperature dependent strain in Ge epilayer with SiGe/Ge buffer layer on Si substrate with different thickness
Wu, Po-Hung, Huang, Ying-Sheng, Hsu, Hung-Pin, Li, Cheng, Huang, Shi-Hao, Tiong, Kwong-KauVolume:
104
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4884063
Date:
June, 2014
Fichier:
PDF, 787 KB
english, 2014