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HfO[sub 2] high-κ gate dielectrics on Ge (100) by atomic oxygen beam deposition
Dimoulas, A., Mavrou, G., Vellianitis, G., Evangelou, E., Boukos, N., Houssa, M., Caymax, M.Volume:
86
Année:
2005
Langue:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1854195
Fichier:
PDF, 478 KB
english, 2005