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[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - FinFET process refinements for improved mobility and gate work function engineering
Yang-Kyu Choi,, Leland Chang,, Ranade, P., Jeong-Soo Lee,, Daewon Ha,, Balasubramanian, S., Agarwal, A., Ameen, M., Tsu-Jae King,, Bokor, J.Année:
2002
Langue:
english
DOI:
10.1109/iedm.2002.1175827
Fichier:
PDF, 351 KB
english, 2002