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Study of stress in tensile nitrogen-plasma-treated multilayer silicon nitride films
P. Morin, G. Raymond, D. Benoit, D. Guiheux, R. Pantel, F. Volpi, M. BracciniAnnée:
2011
Langue:
english
DOI:
10.1116/1.3602082
Fichier:
PDF, 967 KB
english, 2011