Effects of ion beam application on the deposition of low-resistivity titanium nitride films onto silicon
Yokota, Katsuhiro, Nakamura, Kazuhiro, Kasuya, Tomohiko, Mukai, Katsuhisa, Ohnishi, MasamiVolume:
21
Année:
2003
Langue:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1609458
Fichier:
PDF, 644 KB
english, 2003