
[IEEE 2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA 2012) - Singapore, Singapore (2012.07.2-2012.07.6)] 2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - EELS chemical bond characterization of process induced damages in low-k dielectric films
Zhou, YongKai, Zhu, Jie, Du, AnYan, Hua, YouNan, Zhao, SiPing, Liu, Wei, Zhang, Fan, Tan, Juan BoonAnnée:
2012
Langue:
english
DOI:
10.1109/ipfa.2012.6306296
Fichier:
PDF, 1.62 MB
english, 2012