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[IEEE 2005 International Semiconductor Device Research Symposium - Bethesda, Maryland, USA (Dec. 7-9, 2005)] 2005 International Semiconductor Device Research Symposium - Nanocrystalline-si thin film fabricated by inductively coupled plasma chemical vapor deposition for flexible electronics
Sang-Myeon Han,, Joong-Hyun Park,, Hye-Jin Lee,, Kwang-Sub Shin,, Min-Koo Han,Année:
2005
Langue:
english
DOI:
10.1109/isdrs.2005.1596175
Fichier:
PDF, 670 KB
english, 2005