Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides
Ceschia, M., Paccagnella, A., Cester, A., Scarpa, A., Ghidini, G.Volume:
45
Langue:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/23.736457
Date:
January, 1998
Fichier:
PDF, 863 KB
english, 1998