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[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Highly scalable on-axis confined cell structure for high density PRAM beyond 256Mb
Cho, S.L., Yi, J.H., Ha, Y.H., Kuh, B.J., Lee, C.M., Park, J.H., Nam, S.D., Horii, H., Cho, B.O., Ryoo, K.C., Park, S.O., Kim, H.S., Chung, U-In., Moon, J.T., Ryu., B.I.Année:
2005
Langue:
english
DOI:
10.1109/.2005.1469226
Fichier:
PDF, 379 KB
english, 2005